The 72nd Divisional Meeting of Division of Colloid and Surface Chemistry
Sep 15 - Sep 21, 2021
The 72nd Divisional Meeting of Division of Colloid and Surface Chemistry
Sep 15 - Sep 21, 2021
[1C10]Anti-readsorption of Photoresist with Pluronic Surfactant: Effects of Solvent Composition
*Yasufumi Nagai1, Hidekazu Oohinata2, Masaaki Akamatsu1, Kenichi Sakai1,3, Hideki Sakai1,3(1. Faculty of Sci. and Tech., Tokyo Univ. of Science (Japan), 2. Nomura Micro Science Co., Ltd. (Japan), 3. Research Institute for Sci. and Tech., Tokyo Univ. of Science (Japan))
Keywords:
Alkylene carbonate,Photoresist,Pluronic surfactant,Quartz crystal microbalance with dissipation monitoring
Password required to view
Please enter password to view abstract.
The password has been sent to participants by e-mail. You can also find the password on the last page of the program booklet.
The password has been sent to participants by e-mail. You can also find the password on the last page of the program booklet.