The 38th International Conference of Photopolymer Science and Technology
Jun 15 - Jul 14, 2021Online
The 38th International Conference of Photopolymer Science and Technology
Jun 15 - Jul 14, 2021Online
[A-15][Invited] Defect Mitigation in Sub-20 nm Patterning with High-Chi Silicon Containing Block Copolymers
Jan Doise (1), Jai Hyun Koh (2), Ji Yeon Kim (2), Qingjun Zhu (2), Natsuko Kinoshita (2), Hyo Seon Suh (1), Paulina Rincon Delgadillo (1), Geert Vandenberghe (1), C. Grant Willson (2), 〇Christopher J. Ellison (3)((1) IMEC, (2) University of Texas at Austin, (3) University of Minnesota)