[A-37][Invited] New Approaches to EUV Photoresists: Expanding the Polymer Toolbox
Jingyuan Deng (1), Florian Kaefer (2), Sean Bailey (2), Yusuke Otsubo (2,3), 〇Christopher K. Ober (2)((1) Department of Chemistry and Chemical Biology, Cornell University, (2) Department of Materials Science & Engineering, Cornell University, (3) JSR)
30min.