The 38th International Conference of Photopolymer Science and Technology
Jun 15 - Jul 14, 2021Online
The 38th International Conference of Photopolymer Science and Technology
Jun 15 - Jul 14, 2021Online
[A-40]Development of Negative-Type Molecular Ion Resist Materials using Polarity Change by EUV Exposure
Kohei Fujisawa (1), Hiroyuki Maekawa (1), Hiroto Kudo (1), Kazumasa Okamoto (2), Takahiro Kozawa (2)((1) Kansai University, (2) Osaka University)