[MEET1-2] Electron Beam Lithography of PMMA Film Using Direct Growth CNT Cold Cathode Emitter | Proceedings of the International Display Workshops Volume 26 (IDW '19)

Proceedings of the International Display Workshops Volume 26 (IDW '19)

Nov 27 - Nov 29, 2019Sapporo Convention Center

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Proceedings of the International Display Workshops Volume 26 (IDW '19)

Nov 27 - Nov 29, 2019Sapporo Convention Center

[MEET1-2]Electron Beam Lithography of PMMA Film Using Direct Growth CNT Cold Cathode Emitter

*Ok Jung Hwang¹, Ha Rim Lee¹, Kyu Chang Park¹(1. University of Kyunghee (Korea))

https://doi.org/10.36463/idw.2019.1431

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Keywords:

carbon nanotube (CNT),electron beam(e-beam) lithography,VACNTs

We have developed on electron beam (e-beam) lithography system with novel electron source using vertically aligned carbon nanotubes (VACNTs). After the beam was exposed, the PMMA film on ITO glass was developed in MIBK: IPA developer (MIBK: IPA=1:3). As a result, we observed lithography pattern less than 100 um without electric and magnetic lens. This cold cathode emitter is differentiated from the previous electron source for e-beam lithography.

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