Proceedings of the International Display Workshops Volume 27 (IDW '20)

Proceedings of the International Display Workshops Volume 27 (IDW '20)

Dec 9 - Dec 11, 2020Virtual Conference
The International Display Workshops
Proceedings of the International Display Workshops Volume 27 (IDW '20)

Proceedings of the International Display Workshops Volume 27 (IDW '20)

Dec 9 - Dec 11, 2020Virtual Conference

[AMD1-2]Simulation Study of Dual-Gate Amorphous Oxide Semiconductor Thin-Film Transistors

*Katsumi Abe1, Kazuki Ota1, Takeshi Kuwagaki1(1. Silvaco Japan Co., Ltd.(Japan))
https://doi.org/10.36463/idw.2020.0141

Keywords:

Amorphous oxide semiconductor,Thin-film transistor,Dual-gate,Device simulation

We studied the characteristic operations of dual-gate amorphous oxide semiconductor thin-film transistors via device simulations. These simulations reproduced the wide threshold voltage control range, the small drain voltage dependence of the saturation current, and the increased current capability under dual-gate operation conditions. As a result, these operating mechanisms are clarified.