[AMD1-2]Simulation Study of Dual-Gate Amorphous Oxide Semiconductor Thin-Film Transistors
*Katsumi Abe1, Kazuki Ota1, Takeshi Kuwagaki1(1. Silvaco Japan Co., Ltd.(Japan))
Keywords:
Amorphous oxide semiconductor,Thin-film transistor,Dual-gate,Device simulation
We studied the characteristic operations of dual-gate amorphous oxide semiconductor thin-film transistors via device simulations. These simulations reproduced the wide threshold voltage control range, the small drain voltage dependence of the saturation current, and the increased current capability under dual-gate operation conditions. As a result, these operating mechanisms are clarified.