[OLED3-2 (Invited)] OLED Display with All Pixels Formed through RGB Side-by-side Patterning by Photolithography | Proceedings of the International Display Workshops Volume 30 (IDW '23)

Proceedings of the International Display Workshops Volume 30 (IDW '23)

Dec 6 - Dec 8, 2023TOKI MESSE Niigata Convention Center

Back

Proceedings of the International Display Workshops Volume 30 (IDW '23)

Dec 6 - Dec 8, 2023TOKI MESSE Niigata Convention Center

[OLED3-2 (Invited)]OLED Display with All Pixels Formed through RGB Side-by-side Patterning by Photolithography

*Yasumasa Yamane¹, Nozomu Sugisawa¹, Daiki Nakamura¹, Toshiyuki Isa¹, Hitomi Sato¹, Daigo Shimada¹, Shingo Eguchi¹, Toshiki Mizuguchi¹, Yuki Tamatsukuri¹, Minato Ito¹, Kentaro Sugaya¹, Takahiro Fujie¹, Yuichi Yanagisawa¹, Yoshikazu Hiura¹, Ryota Hodo¹, Shinya Sasagawa¹, Hitoshi Kunitake¹, Shunpei Yamazaki¹(1. Semiconductor Energy Laboratory Co., Ltd. (Japan))

https://doi.org/10.36463/idw.2023.0569

Download PDF

Keywords:

OLED,metal mask-less lithography (MML),SBS

We developed a side-by-side photolithographic patterning technology not using a fine metal mask to achieve high resolution for all RGB pixels. This technology will be a general-purpose technology for fabricating OLEDs because of its scalability and wide application to AR/VR microdisplays, small- or medium-sized smartphone displays, and large-sized TVs.

Back