[AMD2] Advanced TFT Technology

9:20 AM - 9:40 AM JST(12:20 AM - 12:40 AM UTC)Invited

[AMD2-2(Invited)] On the Scalability of Nanosheet Oxide Semiconductor FETs

*Masaharu Kobayashi¹, Kaito Hikake¹, Xingyu Huang¹, Sunghun Kim¹, Kota Sakai¹, Zhuo Li¹, Tomoko Mizutani¹, Takuya Saraya¹, Toshiro Hiramoto¹, Takanori Takahashi², Mutsunori Uenuma², Yukiharu Uraoka² (1. The University of Tokyo (Japan), 2. Nara Institute of Science and Technology (Japan))

Keywords:

nanosheet,oxide semiconductor,monolithic 3D integration,ALD