Presentation Information
[AMD5/FMC7-4L]Highly Reliable Hydrogen-Free Top-Gate Oxide TFT ~ Hydrogen-Free ICP-CVD SiO2 and SiNx films for TFTs ~
*Mamoru Furuta1, Mir Mutakabbir Alom1, Motoki Ando1, Yoshihiro Sato2, Takafumi Kambe2, Tsutomu Satoyoshi2 (1. Kochi University of Technology (Japan), 2. Tokyo Electron Technology Solutions Ltd (Japan))
Keywords:
Oxide TFT,Reliability,Hydrogen-free,ICP-CVD,Top-gate
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