Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center
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The International Display Workshops
Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

[AMD5/FMC7-4L]Highly Reliable Hydrogen-Free Top-Gate Oxide TFT ~ Hydrogen-Free ICP-CVD SiO2 and SiNx films for TFTs ~

*Mamoru Furuta1, Mir Mutakabbir Alom1, Motoki Ando1, Yoshihiro Sato2, Takafumi Kambe2, Tsutomu Satoyoshi2(1. Kochi University of Technology (Japan), 2. Tokyo Electron Technology Solutions Ltd (Japan))
https://doi.org/10.36463/idw.2024.0223
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Keywords:

Oxide TFT,Reliability,Hydrogen-free,ICP-CVD,Top-gate

In this presentation, hydrogen-free SiO2 and SiNx films were successfully deposited by large-area inductively coupled plasma chemical vapor deposition (ICP-CVD) using hydrogen-free source gases. The self-aligned top-gate hydrogen-free In–Ga-Zn–Sn–O (IGZTO) TFT is demonstrated toward highly reliable oxide TFTs.
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