[AMDp2-2] Photolithography-Free Fabrication of a-IGZO Thin-Film Transistor Array for Active-Matrix Organic Light-Emitting Diode Displays | Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

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Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

[AMDp2-2]Photolithography-Free Fabrication of a-IGZO Thin-Film Transistor Array for Active-Matrix Organic Light-Emitting Diode Displays

*Changyun Na¹, Changjun No¹, Sungkyu Jang¹, Hoyeon Yun¹, Suyoung Kim¹, Mingi Kim¹, Yurim Jeong¹, Junyeop Lee¹, Yun Ah Kim¹, Sung Min Cho¹(1. Sungkyunkwan University (Korea))

https://doi.org/10.36463/idw.2024.0278

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Keywords:

a-IGZO,TFT,self-align imprint lithography,Plasma etching

An a-IGZO TFT array was successfully fabricated using a self-aligned imprint lithography (SAIL) process. This SAIL process consists of two steps: imprint and plasma etching, with no photolithography required. A three-dimensional structure is created through the imprinting process using UV-curable resin. After that, the pattern is formed by sequentially plasma etching. All 25 TFTs in the TFT array fabricated in this way showed proper switching characteristics.

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