Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center
The International Display Workshops
Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

[FLX1-3(Invited)]High-Sensitive Active-Matrix Strain Sensor Based on Organic TFT

*Shohei Koizumi1, Shusuke Kanazawa2,3, Motoshi Itagaki2,3, Changhoon Shim1, Kentaro Yamada1, Seiji Hashiba1, Makoto Nakazumi1, Yoshiaki Kito1(1. Nikon Corporation (Japan), 2. National Institute of Advanced Industrial Science and Technology (Japan), 3. Sensia Technology Co. Ltd (Japan))
https://doi.org/10.36463/idw.2024.1304

Keywords:

Organic transistor,Wet process,strain sensor,exposure system,flexible substrate

We developed equipment such as a direct imaging exposure system for the roll-to-roll process and used roll to roll equipment to develop organic transistors. In this study, we developed a flexible strain sensor device that takes advantage of the flexibility of organic transistors. This sensor is a new device that can measure strain distribution with high sensitivity.