Presentation Information
[FLX1-3(Invited)]High-Sensitive Active-Matrix Strain Sensor Based on Organic TFT
*Shohei Koizumi1, Shusuke Kanazawa2,3, Motoshi Itagaki2,3, Changhoon Shim1, Kentaro Yamada1, Seiji Hashiba1, Makoto Nakazumi1, Yoshiaki Kito1 (1. Nikon Corporation (Japan), 2. National Institute of Advanced Industrial Science and Technology (Japan), 3. Sensia Technology Co. Ltd (Japan))
Keywords:
Organic transistor,Wet process,strain sensor,exposure system,flexible substrate
Password required to view
To view or download the proceedings, please log into your Confit account using the "Log in" button.
If you do not have a Confit account, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.
If you do not have a Confit account, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.
orLog in
Comment
To browse or post comments, you must log in.Log in