[FMC9/OLED7-2(Invited)] Solution-Processed Ultra-High Barrier Film for Organic Electronics Through Vacuum UV Irradiation | Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

Back

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

[FMC9/OLED7-2(Invited)]Solution-Processed Ultra-High Barrier Film for Organic Electronics Through Vacuum UV Irradiation

*He Sun¹, Luyang Song¹, Yoshiyuki Suzuri¹(1. Yamagata University (Japan))

https://doi.org/10.36463/idw.2024.0387

Download PDF

Keywords:

moisture barrier,VUV photo-chemical reaction & densification,solution processed SiNx film

Our research demonstrates that solution-processed SiNx barrier films, optimized with PHPS and PDMS layers and enhanced by VUV irradiation, can rapidly achieve ultrahigh barrier performance of up to 1.6 x 10^-5 g m^-2 day^-1, making them suitable for industrial production of advanced organic electronic devices.

Back