Proceedings of the International Display Workshops Volume 31 (IDW '24)
Dec 4 - Dec 6, 2024Sapporo Convention Center
Proceedings of the International Display Workshops Volume 31 (IDW '24)
Dec 4 - Dec 6, 2024Sapporo Convention Center
[FMCp1-3]High-UV-Transmittable Black Pigment for Advanced Black Resist Processing
*Hiroto Akaike1, Naoyuki Aiba2, Shozo Komiyama2, Kensuke Kageyama2(1. Mitsubishi Materials Corporation (Japan), 2. Mitsubishi Materials Electronic Chemicals Co.,Ltd (Japan))
Keywords:
Black pigments,Black resist,Photolithography
We have developed a novel high-UV-transmittable black pigment called NITRBLACK UB-2 for primarily black resist processing. A black resist film containing this black pigment can be easily cured by UV light compared with those containing other pigments such as carbon black, thereby facilitating the formation of fine patterned films in photolithographic processes.