Presentation Information
[FMCp2-1]A Metal for Making Different Cu Taper in Etching Fluid
*Hui Wang1, Kang Long1, Zhihui Song1, HuiHua Liao1, Huang I. Chen1, James Hsu1, Wade Chen1 (1. Changsha HKC Optoelectronics Technology Co.,Ltd (China))
Keywords:
different Cu taper,metal1&2short,Dark line ratio,metal breakage and residue
Password required to view
To view or download the proceedings, please log into your A-Pass using the "Log in" button.
If you do not have a A-Pass, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.
If you do not have a A-Pass, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.
Log in
or
Comment
To browse or post comments, you must log in.Log in