[FMCp2-8]New Gen.6 Exposure Tools and Technologies for Improving Overlay Accuracy
*Nobuhiko Yabu1, Sunao Endo1, Qu Zhang1, Reo Sasaki1, Takeshi Fujita1, Tomohiro Nishikawa1, Tomoya Yoshizawa1, Yoshinori Osaki1(1. Canon Inc. (Japan))
Keywords:
Gen.6,lithography tools,overlay accuracy
Canon has released MPAsp-E1003H, new Gen.6 exposure tools with high resolution and high productivity. They also achieve high overlay accuracy by new distortion compensation technology.