Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center
The International Display Workshops
Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

[FMCp2-8]New Gen.6 Exposure Tools and Technologies for Improving Overlay Accuracy

*Nobuhiko Yabu1, Sunao Endo1, Qu Zhang1, Reo Sasaki1, Takeshi Fujita1, Tomohiro Nishikawa1, Tomoya Yoshizawa1, Yoshinori Osaki1(1. Canon Inc. (Japan))
https://doi.org/10.36463/idw.2024.0486

Keywords:

Gen.6,lithography tools,overlay accuracy

Canon has released MPAsp-E1003H, new Gen.6 exposure tools with high resolution and high productivity. They also achieve high overlay accuracy by new distortion compensation technology.