[MEET1-3(Invited)] Carbon Nanotube Based Cold Cathode Electron Beam (C-beam) for Semiconductor Manufacturing Process | Proceedings of the International Display Workshops Volume 31 (IDW '24)

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

Back

Proceedings of the International Display Workshops Volume 31 (IDW '24)

Dec 4 - Dec 6, 2024Sapporo Convention Center

[MEET1-3(Invited)]Carbon Nanotube Based Cold Cathode Electron Beam (C-beam) for Semiconductor Manufacturing Process

*Kyu Chang Park¹, Iksu Kim¹, Umesh Balaso¹(1. Kyung Hee University (Korea))

https://doi.org/10.36463/idw.2024.1080

Download PDF

Keywords:

CNT(carbon nanotube),EUV(extreme ultraviolet),Electron beam,Hole drilling,microscopy

Cold cathode-based electron beam (C-beam) is one of the crucial sources for semiconductor manufacturing process. We developed various C-beams for extreme ultraviolet lighting, scanning electron microscope, holes drilling for fine metal mask, and x-ray. Detail of C-beam development status for EUV lighting, hole drilling, microscope and x-ray application would be presented.

Back