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Metal Oxynitride Semiconductor Prepared by Reactive Sputtering of Metal Oxide Target for Thin Film Devices

Micro/NanoDisplays and Nanotechnology Applications (4)

The 31st International Display Workshops (IDW '24)

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[MEET5-2(Invited)]Metal Oxynitride Semiconductor Prepared by Reactive Sputtering of Metal Oxide Target for Thin Film Devices

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