Presentation Information

[AMD2-4L]High-Performance p-Type Tellurium-Selenium Oxide Thin-Film Transistors Fabricated by Sputtering

*Hojeong Jo1, Seongcheol Jang1, Hyun-suk Kim1 (1. Dongguk University (Korea))

Keywords:

p-type oxide thin-film transistor,RF magnetron sputtering,high-k gate dielectric,Te

Password required to view

To view or download the proceedings, please log into your A-Pass using the "Log in" button.

If you do not have a A-Pass, enter the password provided by the IDW Secretariat in the designated box and click the "Authenticate" button.

Comment

To browse or post comments, you must log in.Log in