[17a-D6-3]Structural change of hydrogenated amorphous carbon films using rf plasma CVD with application of pulsed bias voltage
○Xiaolong Zhou1, Keiji Komatsu1, Ikumi Toda1, Shigeo Ohshio1, Hiroyuki Muratsu1, Haruhiko Ito1, Hidetoshi Saitoh1(Nagaoka Nniv. Tech.1)
