[17a-D6-7]Acid resistance of hydrogenated amorphous carbon films under bias voltage evaluated by surface plasmon resonance phenomenon
○Yasuyuki Nakaya1, Keiji Komatsu1, Ikumi Toda1, Shigeo Ohshio1, Hiroyuki Muramatsu1, Hidetoshi Saitoh1(Nagaoka Univ. Tech.1)
