[17a-E10-4]Chemical Vapor Deposition of ZnO Films using Remote Plasma Generated near Atmospheric Pressure
○(D)Yukinori Nose1, Takuya Kiguchi1, Tatsuru Nakamura1, Takeshi Yoshimura1, Atsushi Ashida1, Tsuyoshi Uehara2, Norifumi Fujimura1(Osaka Prefecture Univ.1, SEKISUI CHEMICAL CO., LTD.2)
