The 69th JSAP Spring Meeting 2022
Mar 22 - Apr 18, 2022Sagamihara Campus, Aoyama Gakuin University & Online
The 69th JSAP Spring Meeting 2022
Mar 22 - Apr 18, 2022Sagamihara Campus, Aoyama Gakuin University & Online
[22a-P01-10]Evaluation of the sensitizing effect in positive type electron beam resist SML by oxygen plasma irradiation
〇Miho Fujimoto1, Akihiro Matsutani1(1.Tokyo Tech.)
Keywords:
electron beam lithography,plasma,SML
A positive-tone electron beam lithography resist known as SML has similar processing parameters to PMMA, but with enhanced performance. However, the sensitivity of SML is almost 5 times lower than that of ZEP resist. In this work, we study the sensitizing effect by oxgen plasma irradiation to the surface of SML resist to increase the sensitivity.