SISPAD2023

SISPAD2023

Sep 26 - Sep 29, 2023
SISPAD2023

SISPAD2023

Sep 26 - Sep 29, 2023

[Session_4-04]Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures

*Tobias Reiter1, Alexander Toifl2, Andreas Hössinger2, Lado Filipovic1(1. TU Wien, Inst. for Microelectronics, 2. Silvaco Europe Ltd.)