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SISPAD2023
Sep 26
- Sep 29, 2023
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SISPAD2023
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SISPAD2023
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SISPAD2023
Sep 26
- Sep 29, 2023
[Session_4-04]
Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures
*Tobias Reiter
1
, Alexander Toifl
2
, Andreas Hössinger
2
, Lado Filipovic
1
(1. TU Wien, Inst. for Microelectronics, 2. Silvaco Europe Ltd.)
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