1973 International Conference on Solid State Devices
Aug 29 - Aug 31, 1973The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
1973 International Conference on Solid State Devices
Aug 29 - Aug 31, 1973The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[2-4]Anomalous Enhancement of Etching Rate of Silicon Nitride with HF Etchant by Ion Implantation
Y. Akasaka, K. Horie K. Nomura, S. Kawazu(1.Central Research Laboratory, Mitsubishi Electric Corp., 2.Kitaitami Works)
