International Conference on Solid State Devices and Materials
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1981 Conference on Solid State Devices
Aug 26
- Aug 27, 1981
The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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1981 Conference on Solid State Devices
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1981 Conference on Solid State Devices
Aug 26
- Aug 27, 1981
The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[A-3-8]
Ammonia annealed SiO2 films for thin gate insulator
I. KATO, T. ITO, S. INOUE, T. NAKAMURA, H. ISHIKAWA(1.FUJITSU LABORATORIES LTD.)
https://doi.org/10.7567/SSDM.1981.A-3-8
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