1981 Conference on Solid State Devices
Aug 26 - Aug 27, 1981The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
1981 Conference on Solid State Devices
Aug 26 - Aug 27, 1981The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[A-4-2]Recrystallization of Silicon Film on Nitride/Oxide double Insulating Structure by CW Laser Irradiation
T. Nishimura, H. Sakurai, S. Nagao, T. Isu, Y. Akasaka, N. Tsubouchi(1.LSI Development Laboratory, Mitsubishi Electric Corporation, 2.Central Research Laboratory, Mitsubishi Electric Corporation)
