1990 International Conference on Solid State Devices and Materials
Aug 22 - Aug 24, 1990Hotel Sendai Plaza, Sendai, Japan
1990 International Conference on Solid State Devices and Materials
Aug 22 - Aug 24, 1990Hotel Sendai Plaza, Sendai, Japan
[C-2-10]Tantalum Oxide Films Formed by UV Photo-CVD Using Oxygen and Ozone and Its Photo-Chemical Leakage Current Reduction Mechanism
Satoshi TANIMOTO, Masahiro MATSUI, Minoru AOYAGI, Koichi KAMISAKO, Koichi KUROIWA, Yasuo TARUI(1.Department of Electronic Engineering, Tokyo University of Agriculture and Technology)
