1990 International Conference on Solid State Devices and Materials

1990 International Conference on Solid State Devices and Materials

Aug 22 - Aug 24, 1990Hotel Sendai Plaza, Sendai, Japan
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International Conference on Solid State Devices and Materials
1990 International Conference on Solid State Devices and Materials

1990 International Conference on Solid State Devices and Materials

Aug 22 - Aug 24, 1990Hotel Sendai Plaza, Sendai, Japan

[C-2-7]Low Temperature Deposition of High Quality Silicon Oxide Films

Hideo IZAWA, Yutaka NISHI, Masaya OKAMOTO, Hiroshi MORIMOTO, Mitsuo ISHII(1.Giant Electronics Technology Co., 2.Liquid Crystal Laboratories and Liquid Crystal Display Group, Sharp Co.)
https://doi.org/10.7567/SSDM.1990.C-2-7
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