1993 International Conference on Solid State Devices and Materials
Aug 29 - Sep 1, 1993Makuhari Messe, Chiba, Japan
1993 International Conference on Solid State Devices and Materials
Aug 29 - Sep 1, 1993Makuhari Messe, Chiba, Japan
[S-III-3]Layer-by-Layer Etching of Si by Self-Limited Adsorption of Chlorine with Alternated Irradiation of Low Energy Ar+ Ions
Takashi MATSUURA, Junichi MUROTA, Yasuji SAWADA, Tadahiro OHMI(1.Laboratory for Microelectronics, Research Institute of Electrical Communication, Department of Electronic Engineering, Faculty of Engineering, Tohoku University)
