2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
[A-10-1]High Performance Poly-Si Device with Thin Gate Oxide Film Grown by Plasma Oxidation Technology
Fuminobu Imaizumi, Tomohiko Hayashi, Katsuji Ishii, Akinobu Teramoto, Masaki Hirayama, Shigetoshi Sugawa, Tadahiro Ohmi(1.The New Industry Creation Hatchery Center, Tohoku University, 2.Graduate school of Engineering, Tohoku University)
