2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
[A-2-6]Gate Engineering to prevent NMOS Dopant Channeling for Nano-Scale CMOSFET Technology
S.H. Park, H.D. Lee, J.S. Kim, S.H Baek, H. Chang, J.H. Lee, K.C. Kim, B.S. Song, H.K. Bae, M.O. Kim, H.S. Lee, Y.S. Kang, D.B. Kim(1.System IC R&D Division, Hynix Semiconductor Inc., 2.Dept. of Electronics Engineering, Chungnam National University)
