2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
[A-3-1]Integration Issues of HfO2-Al2O3 Laminate for Gate and Capacitor Dielectric
Jong-Ho Lee(1.Advanced Process Development Team, System LSI Division, Samsung Electronics Co., Ltd.)
