2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
[A-7-4]Characterization of Soft Breakdown Effects for Post-deposition NH3 Plasma Treated HfO2 Gate Dielectrics
Jer Chyi Wang, De Ching Shie, Tan Fu Lei, Chung Len Lee(1.Department of Electronics Engineering, National Chiao Tung University)
