[A-8-1]Schottky Barrier Height Reduction and Drive Current Improvement in Metal Source/Drain MOSFET with Strained-Si Channel
Atsushi Yagishita, Tsu-Jae King, Jeffrey Bokor(1.Process & Manufacturing Engineering Center, Semiconductor Company, Toshiba Corporation, 2.University of California at Berkeley, Department of Electrical Engineering and Computer Sciences)
