2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
2003 International Conference on Solid State Devices and Materials
Sep 16 - Sep 18, 2003Keio Plaza Inter-Continental Tokyo (Keio Plaza Hotel), Tokyo, Japan
[A-9-3]Characterization of Plasma Nitridation Impact on Lateral Extension Profile in 50nm N-MOSFET by Scanning Tunneling Microscopy
Hidenobu Fukutome, Takashi Saiki, Mitsuaki Hori, Takuji Tanaka, Ryou Nakamura, Hiroshi Arimoto(1.FUJITSU LABORATORIES LTD., Silicon technologies laboratories, Advanced CMOS technology lab., 2.FUJITSU LTD., Advanced LSI development div.)
