2008 International Conference on Solid State Devices and Materials
Sep 23 - Sep 26, 2008Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
2008 International Conference on Solid State Devices and Materials
Sep 23 - Sep 26, 2008Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan
[A-8-3]Dual Metal Gate Technology with Metal Inserted FUSI Stack (MIFS) using Single Phase FUSI for Scaled High-k CMOSFETs
M. Kadoshima1, T. Matsuki1, T. Aminaka1, E. Kurosawa1, M. Kitajima1, T. Aoyama1, Y. Nara1, Y. Ohji1(1.Selete, Japan)
