[B-2-02]Study about the Ion Beam Etching (IBE) Process for the High Density Spintronic Devices and its Damage Recovery by the Oxygen Showering Post-treatment (OSP)
○J. Jeong1,2, T. Endoh1,3,4(1.Tohoku Univ.(Japan), 2.Samsung Electronics Co. Ltd(Korea), 3.CIES, Tohoku Univ.(Japan), 4.JST-ACCEL(Japan))
