[A-1-01]Charging-induced stabilization of ferroelectric orthorhombic HfO2 films:first-principles study on key growth conditions
〇Kazuaki Arai1, Yuto Shiraishi1, Riki Nagasawa1, Masaaki Araidai2, Kenji Shiraishi2, Takasi Nakayama1(1. Chiba Univ.(Japan), 2. Nagoya Univ.(Japan))
