Presentation Information
[A-2-05]Mechanism of Fluorine-induced Suppression of Effective Work Function Lowering in TiN/TiAlC Metal Gate Electrodes
〇Kenzo Manabe1, Kazuya Uejima1, Hiroyuki Ota1, Yukinori Morita1, Atsushi Yagishita1, Toshifumi Irisawa1, Yoshihiro Hayashi1 (1. AIST (Japan))