1975年9月1日〜9月2日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[A-1-3]Microfabrication of Anti-Reflective Chromium Mask by Gas Plasmas
Haruhiko ABE、Kyusaku NISHIOKA、Setsuko TAMURA、Akira NISHIMOTO(1.Central Research Laboratories, Mitsubishi Electric Corp.、2.Kitaitami Works, Mitsubishi Electric Corp.)