1975 Conference on Solid State Devices

1975 Conference on Solid State Devices

1975年9月1日〜9月2日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1975 Conference on Solid State Devices

1975 Conference on Solid State Devices

1975年9月1日〜9月2日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-2-2]SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) FILMS APPLIED TO MOS INTEGRATED CIRCUITS

H. Yamoto、M. Okayama、T. Aoki、H. Mochizuki、M. Abe、T. Ando(1.SONY Corp. Semiconductor Product Div. and Semiconductor Development Div. Atsugi Plant)
https://doi.org/10.7567/SSDM.1975.A-2-2
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