1975 Conference on Solid State Devices

1975 Conference on Solid State Devices

1975年9月1日〜9月2日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1975 Conference on Solid State Devices

1975 Conference on Solid State Devices

1975年9月1日〜9月2日The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-6-2]Short Channel, Low Noise UHF MOSFET's Utilizing Molybdenum-Gate Masked Ion-Implantation

T. OKABE、S. OCHI、H. KURONO、J. KAGAMI(1.Central Research Laboratory, Hitachi Ltd.)
https://doi.org/10.7567/SSDM.1975.A-6-2
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