1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

1984年8月30日〜9月1日International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

1984年8月30日〜9月1日International Conference Center Kobe, Kobe, Japan

[A-2-2]Nanometer E-Beam Lithography Using 2-Layer Resist System Composed of Silicone-Based Negative Resist (SNR)

Akio Sugita、Masao Morita、Toshiaki Tamamura(1.Ibaraki Electrical Communication Laboratory, NTT)
https://doi.org/10.7567/SSDM.1984.A-2-2
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