1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

1984年8月30日〜9月1日International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

1984年8月30日〜9月1日International Conference Center Kobe, Kobe, Japan

[A-2-4]Fine Pattern Difinition with Focused Ion Beams and Its Application to X-Ray Mask Fabrication

Toshihiko KANAYAMA、Masanori KOMURO、Hiroshi HIROSHIMA、Tsunehiro OHIRA、Nobufumi ATODA、Hisao TANOUE、Toshio TSURUSHIMA(1.Electrotechnical Laboratory)
https://doi.org/10.7567/SSDM.1984.A-2-4
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