1985 Conference on Solid State Devices and Materials

1985 Conference on Solid State Devices and Materials

1985年8月25日〜8月27日Nippon Toshi Center, Tokyo, Japan
International Conference on Solid State Devices and Materials
1985 Conference on Solid State Devices and Materials

1985 Conference on Solid State Devices and Materials

1985年8月25日〜8月27日Nippon Toshi Center, Tokyo, Japan

[C-1-2]High Quality Hydrogenated Amorphous-Germanium Films Prepared by Photochemical Vapor Deposition

P. Sichanugrist、M. Konagai、K. Takahashi(1.Tokyo Institute of Technology, Department of Physical Electronics)
https://doi.org/10.7567/SSDM.1985.C-1-2