1986 International Conference on Solid State Devices and Materials

1986 International Conference on Solid State Devices and Materials

1986年8月20日〜8月22日Tokyo Prince Hotel, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1986 International Conference on Solid State Devices and Materials

1986 International Conference on Solid State Devices and Materials

1986年8月20日〜8月22日Tokyo Prince Hotel, Tokyo, Japan

[A-3-5]Low Temperature Low Pressure Silicon Epitaxial Growth and Its Application to Advanced Dielectric Isolation Technology

John O. Borland、Dennis N. Schmidt、Alan R. Stivers(1.Epi Applications Laboratory Applied Materials, Inc.、2.Silicon Device Development Westinghouse R&D Center、3.Technology Development Intel Corporation)
https://doi.org/10.7567/SSDM.1986.A-3-5
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