[C-3-2]Electron Spin Resonance Study of a New Positively Charged Defect in Device Oxides Damaged by Soft X-Rays
B. B. Triplett、T. Takahashi、K. Yokogawa、T. Sugano(1.Dept. of Electronic Engineering, University of Tokyo、2.Intel Researcher in Residence、3.Nippon Steel Corporation)
