1988 International Conference on Solid State Devices and Materials
1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan
1988 International Conference on Solid State Devices and Materials
1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan
[A-3-3]Low Temperature CVD Technique for Crystalline Si Deposition
T. Fujii、H. Araki、M. Ohkuni、Y. Tarui(1.Department of Electronic Engineering, Tokyo University of Agriculture & Technology、2.VLSI Development Laboratories, Sharp Corporation)
