1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan

[A-4-2]Effects of Magnetic Fields and Excited Plasma Species on Silicon Oxide Film Formation by Microwave Plasma CVD

Takuya Fukuda、Kazuo Suzuki、Yasuhiro Mochizuki、Michio Ohue、Naohiro Momma、Tadashi Sonobe(1.Hitachi Research Laboratory and Hitachi Works, Hitachi Ltd.)
https://doi.org/10.7567/SSDM.1988.A-4-2
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