1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1988 International Conference on Solid State Devices and Materials

1988 International Conference on Solid State Devices and Materials

1988年8月24日〜8月26日Keio Plaza Hotel, Tokyo, Japan

[A-4-3]Growth of SiO2 Thin Film by Photo-CVD Using 123nm VUV Light

Kohji INOUE、Masanori OKUYAMA、Yoshihiro HAMAKAWA(1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)
https://doi.org/10.7567/SSDM.1988.A-4-3
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